We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Ion Beam Sputtering Equipment.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Ion Beam Sputtering Equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies

Ion Beam Sputtering Equipment Product List

1～6 item / All 6 items

Displayed results
Ion Beam Sputtering Device 'scia Coat 200/500'

Ion Beam Sputtering Device 'scia Coat 200/500'

Introducing the ion beam sputtering device equipped with a maximum of 5 targets (220mm diameter) or 4 targets (300mm diameter)!

The "scia Coat 200/500" is a product compatible with a maximum of 200mm wafer substrates or 300mm x 500mm substrates. The processes include Ion Beam Sputtering (IBS), Ion Beam Etching (IBE), and Dual Ion Beam Sputtering (DIBS). Please feel free to consult us when needed. 【Features】 ■ Compatible with a maximum of 200mm wafer substrates or 300mm x 500mm substrates ■ Can accommodate up to 5 (220mm diameter) or 4 (300mm diameter) targets ■ RF source (120mm to 350mm) ■ Linear Microwave ECR source (2 x 380mm long) *For more details, please refer to the PDF materials or feel free to contact us.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
High Rate Ion Beam Sputtering High-Speed Film Deposition System (HR-PVD)

High Rate Ion Beam Sputtering High-Speed Film Deposition System (HR-PVD)

High-rate and high-quality film formation of dielectric and ferromagnetic materials.

This is a high-speed ion beam sputtering (IBD) device that excels in the deposition of dielectrics such as Al2O3 and SiO2, which typically have low deposition rates in conventional magnetron sputtering, as well as ferromagnetic materials like Fe. By using a helicon plasma source as the ion source and a groundbreaking method that accelerates the high-density ions obtained from it through the application of bias voltage to the target, it achieves high-rate and highly directional film deposition. It also contributes to cost reduction in deposition processes using valuable and rare targets by efficiently utilizing the entire target surface. <Features> ■ High-speed, high-efficiency ion beam sputtering Optimal solution for dielectric and ferromagnetic targets ■ Helicon plasma ion source and target application Achieving both high-speed sputtering and low contamination Reduction of running costs through improved target utilization efficiency Maintenance reduction due to gridless structure Sputtering while keeping the substrate at low temperature through remote plasma configuration ■ Wafer processing Improved step coverage Composite film deposition using cluster tools ■ Excellent directionality Uniform film thickness can be achieved with a highly directional ion beam, resulting in excellent step coverage in film deposition.

  • 1.PNG
  • 2.PNG
  • 3.PNG
  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ferromagnetic film and solid electrolyte film formation solutions

Ferromagnetic film and solid electrolyte film formation solutions

Ion beam sputtering equipment for research and development as well as small-scale production!

The "TFE New Ion Beam Sputtering Series" is a research and development system for small-scale production with a variety of functions, particularly a sputtering solution for ferromagnetic films and solid electrolytes that allows for the formation of ferromagnetic thin films, such as MTJ devices, without plasma damage. Additionally, it is an ion beam sputtering device that achieves good film thickness distribution for solid fuel cell electrolytes. Furthermore, it is a sputtering device that offers the option of manual or automatic load lock, and features complete automatic control via PLC and PC, as well as remote control via the internet. 【Features】 ■ A plasma damage-free process applicable for the deposition of thin films for ferromagnetic elements (MTJ) ■ Excellent film thickness uniformity for solid fuel cell electrolytes (can be equipped with a glove box) ■ Outstanding film thickness uniformity (<2%: 3σ, 200mm wafer) *For more details, please feel free to contact us.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Plasma Quest Limited Company Introduction

Plasma Quest Limited Company Introduction

Remote source ion beam sputtering device manufacturer for remote plasma sources.

PlasmaQuest is a reputable company with a 25-year history in the development and sales of helicon-type high-density ion sources and related application products. The gridless helicon plasma source generates high-density plasma and continues to provide OEM supply to many equipment manufacturers. Utilizing this high-quality plasma source as an ion source, the groundbreaking "HiTUS" system applies bias to the target, enabling sputtering under various conditions and with different targets. It allows for sputtering of high magnetic targets and high dielectric targets, which are considered difficult with conventional magnetron sputtering devices, as well as co-sputtering using heterogeneous targets such as metals and ceramics, making it suitable for a wide range of applications. The company is equipped to flexibly respond to both research applications and production-scale equipment.

  • 20170928_160044.jpg
  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Ion beam sputtering device

Ion beam sputtering device

It is an ion beam sputtering (IBS) device that uses an RF ion source and is equipped with a single stage or planetary stage.

We will design the equipment for research and development or mass production according to customer needs. 【Equipment Features】 - Process operating pressure of 10^-2 Pa (around 10^-4 Torr) Capable of high vacuum film deposition - Low contamination - Non-heated film deposition possible - High-density films - Reactive film deposition possible - Ion beam assist can be added - Good control over film thickness and other parameters

  • Sputtering Equipment
  • Other semiconductors
  • magnet

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Contract film formation services (test film formation of high-quality reaction films, etc.)

Contract film formation services (test film formation of high-quality reaction films, etc.)

We will support the exploration of new materials and the development of film formation processes.

HiTUS Technology Independent current control is performed for the ion source, target, and substrate. With independent control, it becomes possible to freely control not only the sputter rate but also various reactive sputtering processes such as oxide films and nitride films. We strongly support advanced materials research and process development for applications that have been considered difficult with conventional sputtering equipment, such as ferromagnetic film deposition, co-sputtering of metal and ceramic targets, and dielectric/insulating film deposition from metal targets.

  • 20170928_160044.jpg
  • Other metal materials
  • alloy
  • Surface treatment contract service

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.